Abstract
Sputtered Fe-N films with various nitrogen contents were investigated from the point of view of device manufacturing. As-deposited Fe-N films have compressive stress that becomes tensile due to heat treatment. At the optimum N content where soft magnetic properties were realized, the film shows a close to amorphous microstructure. Compared to NiFe, Fe-N has higher reactivity with humidity and lower reactivity with atmospheric pollutants such as Cl and S.
| Original language | English |
|---|---|
| Pages (from-to) | 3921-3923 |
| Number of pages | 3 |
| Journal | IEEE Transactions on Magnetics |
| Volume | 30 |
| Issue number | 6 |
| DOIs | |
| Publication status | Published - 1994 Nov |
| Externally published | Yes |
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Electrical and Electronic Engineering