Strongly phase-segregating block copolymers with sub-20 nm features

Kristian Kempe, Kato L. Killops, Justin E. Poelma, Hyunjung Jung, Joona Bang, Richard Hoogenboom, Helen Tran, Craig J. Hawker, Ulrich S. Schubert, Luis M. Campos

    Research output: Contribution to journalArticlepeer-review

    27 Citations (Scopus)

    Abstract

    The modular synthesis and lithographic potential of diblock copolymers based on polystyrene-block-poly(2-ethyl-2-oxazoline) (PS-b-PEtOx) are highlighted herein. Controlled radical and living cationic polymerization techniques were utilized to synthesize hydrophobic PS and hydrophilic PEtOx building block of varying molar mass. Subsequently, "click" chemistry was used to couple the blocks and obtain a family of PS-b-PEtOx polymers. The influence of molar mass, composition, and thin-film thickness on the microphase-segregated morphology and orientation were investigated with atomic force microscopy (AFM) and grazing incidence small-angle X-ray scattering (GISAXS). Dense hexagonal arrays of cylindrical nanodomains normal to the substrate, having a periodicity of less than 20 nm were obtained.

    Original languageEnglish
    Pages (from-to)677-682
    Number of pages6
    JournalACS Macro Letters
    Volume2
    Issue number8
    DOIs
    Publication statusPublished - 2013 Aug 20

    ASJC Scopus subject areas

    • Organic Chemistry
    • Polymers and Plastics
    • Inorganic Chemistry
    • Materials Chemistry

    Fingerprint

    Dive into the research topics of 'Strongly phase-segregating block copolymers with sub-20 nm features'. Together they form a unique fingerprint.

    Cite this