Abstract
We investigated the structural, optical, and electrical properties of Zn-In-Sn-O (ZITO) films prepared by RF magnetron sputtering for silicon heterojunction solar cells. The effects of Zn addition on the properties of the as-grown films were examined. XRD patterns of the ZITO films deposited at room temperature showed a broad peak. The cross-sectional TEM image of ZITO films at low Zn levels exhibited a typical fine or nanostructure embedded in an amorphous phase. On the other hand, at higher Zn addition, the films exhibited a completely amorphous phase. The carrier concentration decreased with increasing Zn content. The lowest electrical resistivity of 5.5 × 10-4 Ω cm was observed for a ZITO film with 4.83 Zn at.%. All ZITO films grown in this study showed transmittance of over 80% in the visible and near-infrared spectral range. The absorption was less than 5% in the visible region.
Original language | English |
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Pages (from-to) | 233-237 |
Number of pages | 5 |
Journal | Thin Solid Films |
Volume | 589 |
DOIs | |
Publication status | Published - 2015 Aug 31 |
Bibliographical note
Funding Information:This work was supported by the Human Resources Development program ( No. 20124030200120 ) and by the New & Renewable Energy ( No. 20133010011770 ) of the Korea Institute of Energy Technology Evaluation and Planning (KETEP), grant funded by the Korea government, Ministry of Trade, Industry and Energy . Also, this work was supported by the Korea University grant.
Publisher Copyright:
© 2015 Elsevier B.V.
Keywords
- Magnetron sputtering
- Silicon solar cell
- Transparent conducting oxide
- Zinc indium tin oxide
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Surfaces and Interfaces
- Surfaces, Coatings and Films
- Metals and Alloys
- Materials Chemistry