Structural variation of the BaTi4O9 thin films grown by RF magnetron sputtering

Bo Yun Jang, Young Hun Jeong, Suk Jin Lee, Kyong Jae Lee, Sahn Nahm, Ho Jung Sun, Hwack Joo Lee

Research output: Contribution to journalArticlepeer-review

4 Citations (Scopus)


BaTi4O9 thin films were grown on a Pt/Ti/SiO 2/Si substrate using rf magnetron sputtering and the structure of the thin films were then investigated. For the films grown at low temperature (≤350°C), an amorphous phase was formed during the deposition, which then changed to the BaTi5O11 phase when the annealing was conducted below 950°C. However, when the annealing temperature was higher than 950°C, a BaTi4O9 phase was formed. On the contrary, for the films grown at high temperature (>450°C), small BaTi4O9 grains were formed during the deposition, which grew during the annealing. The homogeneous BaTi4O9 thin films were successfully grown on Pt/Ti/SiO2/Si substrate when they were deposited at 550°C and subsequently rapid thermal annealed at 900°C for 3 min.

Original languageEnglish
Pages (from-to)1209-1212
Number of pages4
JournalJournal of the American Ceramic Society
Issue number5
Publication statusPublished - 2005 May

ASJC Scopus subject areas

  • Ceramics and Composites
  • Materials Chemistry


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