Structured BiVO4Photoanode Fabricated via Sputtering for Large Areas and Enhanced Photoelectrochemical Performance

Sucheol Ju, Junho Jun, Soomin Son, Jaemin Park, Hangyu Lim, Wonjoong Kim, Dongwoo Chae, Heon Lee

    Research output: Contribution to journalArticlepeer-review

    19 Citations (Scopus)

    Abstract

    Bismuth vanadate (BiVO4) is a promising photoanode material; however, its efficiency significantly changes depending on the atomic ratio of Bi/V, and there is no suitable method for synthesizing large-area photoanodes. In this study, an efficient BiVO4 photoanode was fabricated via sputtering, by manipulating the molar ratio of Bi/V with V solution annealing. V solution annealing not only adjusted the atomic ratio of Bi/V but also increased the number of O vacancies, thereby improving the charge-separation and charge-transport efficiencies. Consequently, the photocurrent density of the sputtered photoanode with V solution annealing (BVO-V) was 1.86 mA/cm2, which is 23 times higher than that of the sputtered photoanode annealed under air conditions (BVO-A, 81.0 μA/cm2). Furthermore, microcone-patterned fluorine-doped SnO2 was fabricated to increase the active area and reduce the high reflectance, owing to the dense deposition because of the sputtering. Thus, the photocurrent density of the MC-BVO was 3.11 mA/cm2, which is approximately 67% higher than that of BVO-V (1.86 mA/cm2).

    Original languageEnglish
    Pages (from-to)17923-17932
    Number of pages10
    JournalACS Sustainable Chemistry and Engineering
    Volume8
    Issue number49
    DOIs
    Publication statusPublished - 2020 Dec 14

    Bibliographical note

    Funding Information:
    This research was supported by the International Research & Development Program of the National Research Foundation of Korea (NRF) funded by the Ministry of Science and ICT (Grant number: 2019K1A47A02113032), Creative Materials Discovery Program through the National Research Foundation of Korea (NRF) funded by Ministry of Science and ICT (NRF-2018M3D1A1058972), the National Research Foundation of Korea (NRF) grant funded by the Korea government (MSIT) (No. 2020R1A2C3006382).

    Publisher Copyright:
    ©

    Keywords

    • BiVOsputtering
    • PEC water splitting
    • V solution annealing
    • direct printing
    • patterned FTO

    ASJC Scopus subject areas

    • General Chemistry
    • Environmental Chemistry
    • General Chemical Engineering
    • Renewable Energy, Sustainability and the Environment

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