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Studies of pentacene-based thin film devices produced by cluster beam deposition methods

  • Jae Kwang Lee*
  • , Jung Mo Koo
  • , Sang Yun Lee
  • , Tae Young Choi
  • , J. Joo
  • , Jae Yoo Kim
  • , Jong Ho Choi
  • *Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

Abstract

The cluster beam deposition (CBD) method has been applied to fabricate and characterize pentacene-based thin film devices. Atomic force microscopy, scanning electron microscopy, and X-ray diffraction measurements demonstrate that the weakly bound and highly directional cluster beam is effective in producing a highly ordered structure close to a single crystal with a uniform flat film surface. The hole carrier mobility has been determined to be approximately 10-4 cm2/Vs as a lower bound from the J-V characteristics for the ITO/pentacene/Al devices. The Schottky barrier-type MOSFETs with a 10 μm long channel length have been produced and show a typical source-drain current modulation behavior with different gate voltage.

Original languageEnglish
Pages (from-to)451-454
Number of pages4
JournalOptical Materials
Volume21
Issue number1-3
DOIs
Publication statusPublished - 2003 Jan

Bibliographical note

Funding Information:
Authors wish to thank the support of BK21 fellowships (S.Y. Lee and J.-Y. Kim), KBSI, MOE and instruments from the equipment facility of CRM. This work was supported by grant no. R01-1999-00230 from the Basic Research Program of the KOSEF.

Keywords

  • Cluster beam deposition
  • Hole carrier mobility
  • MOSFETs
  • Pentacene

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Spectroscopy
  • Physical and Theoretical Chemistry
  • Organic Chemistry
  • Inorganic Chemistry
  • Electrical and Electronic Engineering

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