Keyphrases
CO 2
100%
Silicon Oxide Film
100%
Defect Density
100%
Hydrogenated Silicon
100%
Hydrogen Dilution
66%
Dilution Concentration
66%
Strongly Coupled
33%
Oxygen Incorporation
33%
Structural Properties
33%
Optoelectronic Properties
33%
CO2 Gas
33%
Plasma-enhanced Chemical Vapor Deposition (PECVD)
33%
Gas Ratio
33%
H Solar Cell
33%
Oxygen Influence
33%
Gas Mixture
33%
Deposition Parameters
33%
Photoconductivity
33%
Unique Signatures
33%
Local Geometry
33%
Density Level
33%
Conventional Radiofrequency
33%
Engineering
Oxide Film
100%
Defect Density
100%
Silicon Oxide
100%
Related Defect
100%
Dilution
66%
Hydrogen Dilution
66%
Chemical Vapor Deposition
33%
Vapor Deposition
33%
Radio Frequency
33%
Structural Property
33%
Deposition Parameter
33%
Solar Cell
33%
Gas Mixture
33%
Material Science
Film
100%
Silicon
100%
Oxide Film
100%
Dilution
100%
Defect Density
75%
Structural Property
25%
Solar Cell
25%
Plasma-Enhanced Chemical Vapor Deposition
25%
Gas Mixture
25%