Sub-50nm featured polymer stamp fabrication for UV nanoimprint lithography

Sung Hoon Hong; Jae Yeon Hwang; Heon Lee

doi:10.1109/IMNC.2007.4456216

Sub-50nm featured polymer stamp fabrication for UV nanoimprint lithography

Sung Hoon Hong, Jae Yeon Hwang, Heon Lee^*

^*Corresponding author for this work

Department of Materials Science and Engineering

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

In this work, using hot embossing lithography, 8-inch sized sub-50nm featured flexible polymer template was clearly fabricated. UV-NIL process was taken on Si substrate with the polymer stamp and sub-50nm pattern was successfully fabricated on Si substrate.

Original language	English
Title of host publication	Digest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC
Publisher	IEEE Computer Society
Pages	286-287
Number of pages	2
ISBN (Print)	4990247248, 9784990247249
DOIs	https://doi.org/10.1109/IMNC.2007.4456216
Publication status	Published - 2007
Event	s20th International Microprocesses and Nanotechnology Conference, MNC 2007 - Kyoto, Japan Duration: 2007 Nov 5 → 2007 Nov 8

Publication series

Name	Digest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC

Other

Other	s20th International Microprocesses and Nanotechnology Conference, MNC 2007
Country/Territory	Japan
City	Kyoto
Period	07/11/5 → 07/11/8

ASJC Scopus subject areas

Hardware and Architecture
Electrical and Electronic Engineering

Access to Document

10.1109/IMNC.2007.4456216

Cite this

Hong, S. H., Hwang, J. Y., & Lee, H. (2007). Sub-50nm featured polymer stamp fabrication for UV nanoimprint lithography. In Digest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC (pp. 286-287). Article 4456216 (Digest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC). IEEE Computer Society. https://doi.org/10.1109/IMNC.2007.4456216

Sub-50nm featured polymer stamp fabrication for UV nanoimprint lithography. / Hong, Sung Hoon; Hwang, Jae Yeon; Lee, Heon.
Digest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC. IEEE Computer Society, 2007. p. 286-287 4456216 (Digest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Hong, SH, Hwang, JY & Lee, H 2007, Sub-50nm featured polymer stamp fabrication for UV nanoimprint lithography. in Digest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC., 4456216, Digest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC, IEEE Computer Society, pp. 286-287, s20th International Microprocesses and Nanotechnology Conference, MNC 2007, Kyoto, Japan, 07/11/5. https://doi.org/10.1109/IMNC.2007.4456216

Hong SH, Hwang JY, Lee H. Sub-50nm featured polymer stamp fabrication for UV nanoimprint lithography. In Digest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC. IEEE Computer Society. 2007. p. 286-287. 4456216. (Digest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC). doi: 10.1109/IMNC.2007.4456216

Hong, Sung Hoon ; Hwang, Jae Yeon ; Lee, Heon. / Sub-50nm featured polymer stamp fabrication for UV nanoimprint lithography. Digest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC. IEEE Computer Society, 2007. pp. 286-287 (Digest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC).

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title = "Sub-50nm featured polymer stamp fabrication for UV nanoimprint lithography",

abstract = "In this work, using hot embossing lithography, 8-inch sized sub-50nm featured flexible polymer template was clearly fabricated. UV-NIL process was taken on Si substrate with the polymer stamp and sub-50nm pattern was successfully fabricated on Si substrate.",

author = "Hong, \{Sung Hoon\} and Hwang, \{Jae Yeon\} and Heon Lee",

year = "2007",

doi = "10.1109/IMNC.2007.4456216",

language = "English",

isbn = "4990247248",

series = "Digest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC",

publisher = "IEEE Computer Society",

pages = "286--287",

booktitle = "Digest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC",

note = "s20th International Microprocesses and Nanotechnology Conference, MNC 2007 ; Conference date: 05-11-2007 Through 08-11-2007",

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AB - In this work, using hot embossing lithography, 8-inch sized sub-50nm featured flexible polymer template was clearly fabricated. UV-NIL process was taken on Si substrate with the polymer stamp and sub-50nm pattern was successfully fabricated on Si substrate.

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M3 - Conference contribution

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SN - 9784990247249

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PB - IEEE Computer Society

T2 - s20th International Microprocesses and Nanotechnology Conference, MNC 2007

Y2 - 5 November 2007 through 8 November 2007

ER -

Sub-50nm featured polymer stamp fabrication for UV nanoimprint lithography

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ASJC Scopus subject areas

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