Synthesis and characterization of fluoro-co-Phenyl silsesquioxane (FCPSQ) for low dielectric constant materials

Seung Sock Choi; He Seung Lee; Eun Kyeong Kim; Kyung Youl Baek; Dong Hoon Choi; Seung Sang Hwang

doi:10.1080/15421400903584507

Synthesis and characterization of fluoro-co-Phenyl silsesquioxane (FCPSQ) for low dielectric constant materials

Seung Sock Choi, He Seung Lee, Eun Kyeong Kim, Kyung Youl Baek, Dong Hoon Choi, Seung Sang Hwang

Department of Chemistry

Research output: Contribution to journal › Article › peer-review

6 Citations (Scopus)

Abstract

A new type of low-k dielectric material, poly(tridecafluoro1,1,2,2, tetrahydrooctyl-co-phenylsilsesquioxane) (PFCPSQ) was synthesized by hydrolysis and condensation reaction of trimethoxysilyl monomers in the presence of a base catalyst in H₂O/THF mixture solvent at 25°C. Chemical compositions, molecular weight, and structure of the obtained PFCPSQs were characterized using ¹H NMR, ²⁹Si NMR, FT-IR, and GPC. Dielectric values were examined by a HP-4190 system and a dielectric constant k of 1.92 was obtained.

Original language	English
Pages (from-to)	231/[507]-238/[514]
Journal	Molecular Crystals and Liquid Crystals
Volume	520
DOIs	https://doi.org/10.1080/15421400903584507
Publication status	Published - 2010 Jan

Bibliographical note

Funding Information:
This research was partially supported by a grant from the Fundamental R&D Program for Core Technology of Materials funded by the Ministry of Knowledge Economy, Republic of Korea. The authors thank the Pohang Accelerator Laboratory for providing the synchrotron radiation source at the 3C2 beam lines used in this study.

Keywords

Dielectric material
Fluorine polymer
Silsesquioxane

ASJC Scopus subject areas

General Chemistry
General Materials Science
Condensed Matter Physics

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10.1080/15421400903584507

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title = "Synthesis and characterization of fluoro-co-Phenyl silsesquioxane (FCPSQ) for low dielectric constant materials",

abstract = "A new type of low-k dielectric material, poly(tridecafluoro1,1,2,2, tetrahydrooctyl-co-phenylsilsesquioxane) (PFCPSQ) was synthesized by hydrolysis and condensation reaction of trimethoxysilyl monomers in the presence of a base catalyst in H2O/THF mixture solvent at 25°C. Chemical compositions, molecular weight, and structure of the obtained PFCPSQs were characterized using 1H NMR, 29Si NMR, FT-IR, and GPC. Dielectric values were examined by a HP-4190 system and a dielectric constant k of 1.92 was obtained.",

keywords = "Dielectric material, Fluorine polymer, Silsesquioxane",

author = "Choi, {Seung Sock} and Lee, {He Seung} and Kim, {Eun Kyeong} and Baek, {Kyung Youl} and Choi, {Dong Hoon} and Hwang, {Seung Sang}",

note = "Funding Information: This research was partially supported by a grant from the Fundamental R&D Program for Core Technology of Materials funded by the Ministry of Knowledge Economy, Republic of Korea. The authors thank the Pohang Accelerator Laboratory for providing the synchrotron radiation source at the 3C2 beam lines used in this study.",

year = "2010",

month = jan,

doi = "10.1080/15421400903584507",

language = "English",

volume = "520",

pages = "231/[507]--238/[514]",

journal = "Molecular Crystals and Liquid Crystals",

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T1 - Synthesis and characterization of fluoro-co-Phenyl silsesquioxane (FCPSQ) for low dielectric constant materials

AU - Choi, Seung Sock

AU - Lee, He Seung

AU - Kim, Eun Kyeong

AU - Baek, Kyung Youl

AU - Choi, Dong Hoon

AU - Hwang, Seung Sang

N1 - Funding Information: This research was partially supported by a grant from the Fundamental R&D Program for Core Technology of Materials funded by the Ministry of Knowledge Economy, Republic of Korea. The authors thank the Pohang Accelerator Laboratory for providing the synchrotron radiation source at the 3C2 beam lines used in this study.

PY - 2010/1

Y1 - 2010/1

N2 - A new type of low-k dielectric material, poly(tridecafluoro1,1,2,2, tetrahydrooctyl-co-phenylsilsesquioxane) (PFCPSQ) was synthesized by hydrolysis and condensation reaction of trimethoxysilyl monomers in the presence of a base catalyst in H2O/THF mixture solvent at 25°C. Chemical compositions, molecular weight, and structure of the obtained PFCPSQs were characterized using 1H NMR, 29Si NMR, FT-IR, and GPC. Dielectric values were examined by a HP-4190 system and a dielectric constant k of 1.92 was obtained.

AB - A new type of low-k dielectric material, poly(tridecafluoro1,1,2,2, tetrahydrooctyl-co-phenylsilsesquioxane) (PFCPSQ) was synthesized by hydrolysis and condensation reaction of trimethoxysilyl monomers in the presence of a base catalyst in H2O/THF mixture solvent at 25°C. Chemical compositions, molecular weight, and structure of the obtained PFCPSQs were characterized using 1H NMR, 29Si NMR, FT-IR, and GPC. Dielectric values were examined by a HP-4190 system and a dielectric constant k of 1.92 was obtained.

KW - Dielectric material

KW - Fluorine polymer

KW - Silsesquioxane

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U2 - 10.1080/15421400903584507

DO - 10.1080/15421400903584507

M3 - Article

AN - SCOPUS:77951448547

SN - 1542-1406

VL - 520

SP - 231/[507]-238/[514]

JO - Molecular Crystals and Liquid Crystals

JF - Molecular Crystals and Liquid Crystals

ER -

Synthesis and characterization of fluoro-co-Phenyl silsesquioxane (FCPSQ) for low dielectric constant materials

Abstract

Bibliographical note

Keywords

ASJC Scopus subject areas

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