Synthesis of novel platinum precursor and its application to metal organic chemical vapor deposition of platinum thin films

A novel platinum aminoalkoxide complex, Pt(dmamp)2 has been prepared by the reaction of cis-(py)₂PtI₂ with two equivalents of Na(dmamp) (dmamp = 1-dimethylamino-2-methyl-2-propanolate). Single-crystal X-ray crystallographic analysis shows that the Pt(dmamp)₂ complex keeps a square planar geometry with each two nitrogen atoms and two oxygen atoms having trans configuration. Platinum films have been deposited on TaN/ Ta/Si substrates by metal organic chemical vapor deposition (MOCVD) using Pt(dmamp)₂. As-deposited platinum thin films did not contain any appreciable amounts of impurities except a little carbon. As the deposition temperature was increased, the films resistivity and deposition rate increased. The electrical resistivity (13.6 μ Ωcm) of Pt film deposited at 400 °C is a little higher than the bulk value (10.5 μ Ωcm) at 293 K. The chemical composition, crystalline structure, and morphology of the deposited films were investigated by X-ray photoelectron spectroscopy, X-ray diffraction, and atomic force microscopy.