Abstract
Ti5NbO14 (T5NO) films were developed on Pt/Ti/SiO2/Si substrates by electrophoretic method by using T5NO3− nanosheets. The film deposited at room temperature (RT) contained organic defects, which were almost eliminated in the film annealed at 700 °C. The film deposited at RT revealed (100) planes with an inter-planar distance of 1.1 nm because of the existence of TBA+ defects. However, for the films annealed at higher temperatures (≥400 °C), two types of structures formed: (100) planes with 0.55 nm inter-planar distance (group-1 structure), and (100) planes with 1.42 nm inter-planar distance (group-2 structure). The dielectric constant (εr) of the film annealed at 700 °C was 61 with a low dielectric loss of 1.0%. Variations in the εr according to the film thickness, electric field, and temperature were small. This film displayed a high insulating property up to 300 °C with a small temperature coefficient of capacitance (−56.7 ppm/K) up to 400 °C.
Original language | English |
---|---|
Pages (from-to) | 3730-3737 |
Number of pages | 8 |
Journal | Journal of the European Ceramic Society |
Volume | 39 |
Issue number | 13 |
DOIs | |
Publication status | Published - 2019 Oct |
Bibliographical note
Funding Information:This research was supported by the Basic Science Research Program through the National Research Foundation of Korea (NRF), funded by the Ministry of Science, ICT & Future Planning (2017R1A2B4007189). We also thank the KU–KIST graduate school program of Korea University.
Funding Information:
This research was supported by the Basic Science Research Program through the National Research Foundation of Korea (NRF), funded by the Ministry of Science, ICT & Future Planning ( 2017R1A2B4007189 ). We also thank the KU–KIST graduate school program of Korea University.
Publisher Copyright:
© 2019 Elsevier Ltd
Keywords
- 2D metal-oxide nanosheets
- Electrophoresis
- High-temperature capacitors
- Titanoniobates
ASJC Scopus subject areas
- Ceramics and Composites
- Materials Chemistry