Keyphrases
A-Si
100%
Vapor Deposition
100%
Hydrogenated Amorphous Silicon Thin Film
100%
Plasma Enhanced
100%
Solar Cell
33%
Optoelectronic Properties
33%
Absorber Layer
33%
Silane
33%
Hydrogen Dilution
33%
Depositional System
16%
Band Gap
16%
Oxygen Incorporation
16%
Hydrogenated
16%
Chemical Structure
16%
Carbon Dioxide CO2
16%
Plasma-enhanced Chemical Vapor Deposition (PECVD)
16%
Wide Bandgap
16%
H2 Gas
16%
High Open-circuit Voltage
16%
Dangling Bonds
16%
Structural Disorder
16%
Oxygen Influence
16%
Gas Mixture
16%
Defect Density
16%
Deposited Film
16%
Bonding Configuration
16%
Reduced Defect Density
16%
Hydrogenated Amorphous Silicon Films
16%
Material Science
Thin Films
100%
Film
100%
Amorphous Silicon
100%
Carbon Dioxide
18%
Solar Cell
18%
Defect Density
18%
Dilution
18%
Electronic Circuit
9%
Structure (Composition)
9%
Plasma-Enhanced Chemical Vapor Deposition
9%
Silane
9%
Gas Mixture
9%