The direct nano-patterning of ZnO using nanoimprint lithography with ZnO-sol and thermal annealing

Ki Yeon Yang, Kyung Min Yoon, Kyung Woo Choi, Heon Lee

Research output: Contribution to journalArticlepeer-review

54 Citations (Scopus)


Nano-patterned ZnO layer was fabricated by ZnO-sol imprinting with a polymeric mold, followed by annealing. Instead of polymer based imprint resin, ZnO-sol was used as an imprint resin. During the imprinting process, the organic solvent in the ZnO-sol was absorbed into a polymeric mold and thus, ZnO-sol was converted to ZnO-gel. These patterns were subsequently annealed at 650 °C for 1 h in atmospheric ambient to form ZnO patterns. X-ray diffraction (XRD) and photoluminescence (PL) confirmed that ZnO-gel was completely converted into ZnO by annealing. Using this ZnO-sol imprinting method, ZnO nano-patterns, as small as 50 nm, were fabricated on Si and oxidized Si wafer substrates. The ZnO nano-patterns were characterized using scanning electron microscopy (SEM) and Transmission electron microscopy (TEM).

Original languageEnglish
Pages (from-to)2228-2231
Number of pages4
JournalMicroelectronic Engineering
Issue number11
Publication statusPublished - 2009 Nov

Bibliographical note

Funding Information:
This work was supported by Korea Health 21 R&D Project (Grant No. A050750) from Ministry of Health and Welfare, basic research program from Korea Science and Nano R&D program through the Korea Science and Engineering Foundation funded by the Ministry of Education, Science and Technology (2008-04501).

Copyright 2009 Elsevier B.V., All rights reserved.


  • Nanoimprint lithography
  • ZnO nano-pattern
  • ZnO-gel
  • ZnO-sol

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Condensed Matter Physics
  • Surfaces, Coatings and Films
  • Electrical and Electronic Engineering


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