The effects of film thickness on the electrical, optical, and structural properties of cylindrical, rotating, magnetron-sputtered ITO films

Jae Ho Kim; Tae Yeon Seong; Kyung Jun Ahn; Kwun Bum Chung; Hae Jun Seok; Hyeong Jin Seo; Han Ki Kim

doi:10.1016/j.apsusc.2018.01.318

The effects of film thickness on the electrical, optical, and structural properties of cylindrical, rotating, magnetron-sputtered ITO films

Jae Ho Kim, Tae Yeon Seong, Kyung Jun Ahn, Kwun Bum Chung, Hae Jun Seok, Hyeong Jin Seo, Han Ki Kim

Research output: Contribution to journal › Article › peer-review

62 Citations (Scopus)

Abstract

We report the characteristics of Sn-doped In ₂ O ₃ (ITO) films intended for use as transparent conducting electrodes; the films were prepared via a five-generation, in-line type, cylindrical, rotating magnetron sputtering (CRMS) system as a function of film thickness. By using a rotating cylindrical ITO target with high usage (∼80%), we prepared high conductivity, transparent ITO films on five-generation size glass. The effects of film thickness on the electrical, optical, morphological, and structural properties of CRMS-grown ITO films are investigated in detail to correlate the thickness and performance of ITO films. The preferred orientation changed from the (2 2 2) to the (4 0 0) plane with increasing thickness of ITO is attributed to the stability of the (4 0 0) plane against resputtering during the CRMS process. Based on X-ray diffraction, surface field emission scanning electron microscopy, and cross-sectional transmission electron microscopy, we suggest a possible mechanism to explain the preferred orientation and effects of film thickness on the performance of CRMS-grown ITO films.

Original language	English
Pages (from-to)	1211-1218
Number of pages	8
Journal	Applied Surface Science
Volume	440
DOIs	https://doi.org/10.1016/j.apsusc.2018.01.318
Publication status	Published - 2018 May 15

Bibliographical note

Funding Information:
This work was supported by the Korea Institute of Energy Technology Evaluation and Planning (KETEP) and the Ministry of Trade, Industry & Energy (MOTIE) of the Republic of Korea (No. 20163010012200) and received partial support from the Technology Innovation Program (or Industrial Strategic Technology Development Program (10079601) funded By the Ministry of Trade, Industry & Energy (MOTIE, Korea).

Publisher Copyright:
© 2018 Elsevier B.V.

Keywords

Cylindrical rotating magnetron sputtering
Preferred orientation
Sn-doped In O
Thickness
Transparent conducting electrodes

ASJC Scopus subject areas

Condensed Matter Physics
Surfaces, Coatings and Films
Surfaces and Interfaces

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10.1016/j.apsusc.2018.01.318

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title = "The effects of film thickness on the electrical, optical, and structural properties of cylindrical, rotating, magnetron-sputtered ITO films",

abstract = " We report the characteristics of Sn-doped In 2 O 3 (ITO) films intended for use as transparent conducting electrodes; the films were prepared via a five-generation, in-line type, cylindrical, rotating magnetron sputtering (CRMS) system as a function of film thickness. By using a rotating cylindrical ITO target with high usage (∼80%), we prepared high conductivity, transparent ITO films on five-generation size glass. The effects of film thickness on the electrical, optical, morphological, and structural properties of CRMS-grown ITO films are investigated in detail to correlate the thickness and performance of ITO films. The preferred orientation changed from the (2 2 2) to the (4 0 0) plane with increasing thickness of ITO is attributed to the stability of the (4 0 0) plane against resputtering during the CRMS process. Based on X-ray diffraction, surface field emission scanning electron microscopy, and cross-sectional transmission electron microscopy, we suggest a possible mechanism to explain the preferred orientation and effects of film thickness on the performance of CRMS-grown ITO films.",

keywords = "Cylindrical rotating magnetron sputtering, Preferred orientation, Sn-doped In O, Thickness, Transparent conducting electrodes",

author = "Kim, {Jae Ho} and Seong, {Tae Yeon} and Ahn, {Kyung Jun} and Chung, {Kwun Bum} and Seok, {Hae Jun} and Seo, {Hyeong Jin} and Kim, {Han Ki}",

note = "Funding Information: This work was supported by the Korea Institute of Energy Technology Evaluation and Planning (KETEP) and the Ministry of Trade, Industry & Energy (MOTIE) of the Republic of Korea (No. 20163010012200) and received partial support from the Technology Innovation Program (or Industrial Strategic Technology Development Program (10079601) funded By the Ministry of Trade, Industry & Energy (MOTIE, Korea). Publisher Copyright: {\textcopyright} 2018 Elsevier B.V.",

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AU - Kim, Jae Ho

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AU - Ahn, Kyung Jun

AU - Chung, Kwun Bum

AU - Seok, Hae Jun

AU - Seo, Hyeong Jin

AU - Kim, Han Ki

N1 - Funding Information: This work was supported by the Korea Institute of Energy Technology Evaluation and Planning (KETEP) and the Ministry of Trade, Industry & Energy (MOTIE) of the Republic of Korea (No. 20163010012200) and received partial support from the Technology Innovation Program (or Industrial Strategic Technology Development Program (10079601) funded By the Ministry of Trade, Industry & Energy (MOTIE, Korea). Publisher Copyright: © 2018 Elsevier B.V.

PY - 2018/5/15

Y1 - 2018/5/15

N2 - We report the characteristics of Sn-doped In 2 O 3 (ITO) films intended for use as transparent conducting electrodes; the films were prepared via a five-generation, in-line type, cylindrical, rotating magnetron sputtering (CRMS) system as a function of film thickness. By using a rotating cylindrical ITO target with high usage (∼80%), we prepared high conductivity, transparent ITO films on five-generation size glass. The effects of film thickness on the electrical, optical, morphological, and structural properties of CRMS-grown ITO films are investigated in detail to correlate the thickness and performance of ITO films. The preferred orientation changed from the (2 2 2) to the (4 0 0) plane with increasing thickness of ITO is attributed to the stability of the (4 0 0) plane against resputtering during the CRMS process. Based on X-ray diffraction, surface field emission scanning electron microscopy, and cross-sectional transmission electron microscopy, we suggest a possible mechanism to explain the preferred orientation and effects of film thickness on the performance of CRMS-grown ITO films.

AB - We report the characteristics of Sn-doped In 2 O 3 (ITO) films intended for use as transparent conducting electrodes; the films were prepared via a five-generation, in-line type, cylindrical, rotating magnetron sputtering (CRMS) system as a function of film thickness. By using a rotating cylindrical ITO target with high usage (∼80%), we prepared high conductivity, transparent ITO films on five-generation size glass. The effects of film thickness on the electrical, optical, morphological, and structural properties of CRMS-grown ITO films are investigated in detail to correlate the thickness and performance of ITO films. The preferred orientation changed from the (2 2 2) to the (4 0 0) plane with increasing thickness of ITO is attributed to the stability of the (4 0 0) plane against resputtering during the CRMS process. Based on X-ray diffraction, surface field emission scanning electron microscopy, and cross-sectional transmission electron microscopy, we suggest a possible mechanism to explain the preferred orientation and effects of film thickness on the performance of CRMS-grown ITO films.

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KW - Thickness

KW - Transparent conducting electrodes

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JF - Applied Surface Science

ER -

The effects of film thickness on the electrical, optical, and structural properties of cylindrical, rotating, magnetron-sputtered ITO films

Abstract

Bibliographical note

Keywords

ASJC Scopus subject areas

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