Skip to main navigation
Skip to search
Skip to main content
Korea University Pure Home
Home
Profiles
Research units
Equipment
Research output
Press/Media
Search by expertise, name or affiliation
The erosion behaviors of Y
2
O
3
and YF
3
coatings under fluorocarbon plasma
Dae Min Kim
, Yoon Suk Oh
, Seongwon Kim
, Hyung Tae Kim
, Dae Soon Lim
, Sung Min Lee
*
*
Corresponding author for this work
Research output
:
Contribution to journal
›
Article
›
peer-review
95
Citations (Scopus)
Overview
Fingerprint
Fingerprint
Dive into the research topics of 'The erosion behaviors of Y
2
O
3
and YF
3
coatings under fluorocarbon plasma'. Together they form a unique fingerprint.
Sort by
Weight
Alphabetically
Keyphrases
Yttrium Oxide
100%
Bias Voltage
100%
Fluorocarbon Plasma
100%
Erosion Behavior
100%
Etching Rate
50%
Chemical Reaction
25%
Fluoride
25%
Plasma-facing Components
25%
XPS Analysis
25%
Fluorine Content
25%
In Situ TEM
25%
Fluorinated
25%
Fluorinated Surface
25%
Y2O3 Coating
25%
Electron Beam Evaporation Method
25%
Surface Fluorination
25%
Contaminant Particles
25%
Engineering
Bias Voltage
100%
Etch Rate
50%
Electron-Beam Evaporation
25%
Facing Material
25%
Material Science
Surface (Surface Science)
100%
Chemical Engineering
Fluorocarbon
100%