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The influence of cu lattices on the structure and electrical properties of graphene domains during low-pressure chemical vapor deposition
Dae Woo Kim
, Seon Joon Kim
, Jae Sung Kim
, Minju Shin
,
Gyu Tae Kim
, Hee Tae Jung
*
*
Corresponding author for this work
Research output
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Article
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peer-review
6
Citations (Scopus)
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Keyphrases
Average Channel
25%
Channel Length
25%
Channel Resistance
25%
Cu Foil
50%
Cu Substrate
25%
Cu(111)
100%
Electrical Properties
100%
Graphene
50%
Graphene Domains
100%
Graphene Islands
25%
Graphene Properties
100%
High Resistance
25%
Intermediate Domain
25%
Low Pressure Chemical Vapor Deposition (LPCVD)
100%
Polycrystalline Graphene
25%
Single-crystalline
25%
Size-and-shape
25%
Structure-property Relationships
100%
Engineering
Channel Length
14%
Channel Resistance
14%
Chemical Vapor Deposition
100%
Graphene
100%
Polycrystalline
14%
Texturing
14%
Vapor Deposition
100%
Material Science
Graphene
100%
Low Pressure Chemical Vapor Deposition
100%