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Thin film silicon substrate formation using electrochemical anodic etching method
J. H. Kwon
, S. H. Lee
,
B. K. Ju
*
*
Corresponding author for this work
Research output
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Contribution to journal
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Article
›
peer-review
3
Citations (Scopus)
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Keyphrases
Silicon Substrate
100%
Etching Process
100%
Porous Silicon Layer
100%
Thin-film Silicon
100%
Electrochemical Anodization
100%
Anodic Etching
100%
Porosity
66%
Layer Transfer
66%
Ethanol
33%
Current Density
33%
Water Solution
33%
Deionized Water
33%
Hydrofluoric Acid
33%
Etching Time
33%
Monocrystalline Silicon Wafer
33%
Substrate Technology
33%
Material Science
Thin Films
100%
Silicon
100%
Porous Silicon
100%
Anodizing
100%
Density
33%
Silicon Wafer
33%