Abstract
Block copolymer (BCP) lithography has generally been synonymous to one- or two-dimensional single layered lithographic templates as a means to fabricate simple nanoscaled structures. Recently, the rapidly increasing demand for complex nanostructures and the corresponding evolution in BCP lithography have led to three-dimensional (3D) BCP nanostructures, which can be fabricated in various ways such as directed self-assembly or stacking of cross-linked BCP patterns. This review covers the recent advances in the 3D multilayered structures from cross-linkable BCPs, which provide an easy and robust means for integrating various BCP structures into one scaffold. In this case, wetting-optimized adjustment of BCP microdomains at the layer interface plays a critical role in the formation of well-defined 3D multilayer nanostructures. (Figure Presented).
Original language | English |
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Pages (from-to) | 287-291 |
Number of pages | 5 |
Journal | ACS Macro Letters |
Volume | 5 |
Issue number | 3 |
DOIs | |
Publication status | Published - 2016 Mar 15 |
Bibliographical note
Publisher Copyright:© 2016 American Chemical Society.
ASJC Scopus subject areas
- Organic Chemistry
- Polymers and Plastics
- Inorganic Chemistry
- Materials Chemistry