Threshold voltage variation-immune FinFET design with metal-interlayer-semiconductor source/drain structure

Changho Shin, Jeong Kyu Kim, Changhwan Shin, Jong Kook Kim, Hyun Yong Yu

    Research output: Contribution to journalArticlepeer-review

    3 Citations (Scopus)

    Fingerprint

    Dive into the research topics of 'Threshold voltage variation-immune FinFET design with metal-interlayer-semiconductor source/drain structure'. Together they form a unique fingerprint.

    Keyphrases

    Engineering

    Material Science