Transfer-free and catalyst-free graphene thin films produced by plasma electron annealing at low temperatures

Unhyeon Kang, Eunbi Jeong, Soeun Ahn, Kyoung Ho Jeon, Sang Ho Lim, Seunghee Han

Research output: Contribution to journalArticlepeer-review

1 Citation (Scopus)

Abstract

Research into graphene, an innovative material, has increased remarkably since Geim and Novoselov won the Nobel Prize in Physics in 2010 for forming single layers of graphene using Scotch tape. Indeed, despite being a remarkable material with excellent properties, graphene is not yet commercialized, owing to a lack of suitable direct-growth preparation methods. To address this issue, in this study we introduce a new method for growing graphene thin films directly on substrates by using a simple and clean plasma electron annealing (PEA) process involving a low processing temperature in a single chamber, which is advantageous. Specifically, we transform the carbon layer deposited on a silicon dioxide wafer into graphene at low temperature by using the electrons in inductively coupled plasma to transfer kinetic energy to the substrate. We expect that the method developed herein will provide new possibilities for future graphene research.

Original languageEnglish
Article number112665
JournalVacuum
Volume218
DOIs
Publication statusPublished - 2023 Dec

Bibliographical note

Publisher Copyright:
© 2023 The Author(s)

Keywords

  • Catalyst-free
  • Direct growth
  • Graphene
  • Inductively coupled plasma
  • Low-temperature
  • Plasma electron annealing
  • Transfer-free

ASJC Scopus subject areas

  • Instrumentation
  • Condensed Matter Physics
  • Surfaces, Coatings and Films

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