Uniform Si-CHA zeolite layers formed by a selective sonication-assisted deposition method

Eunjoo Kim; Wanxi Cai; Hionsuck Baik; Jungkyu Choi

doi:10.1002/anie.201301265

Uniform Si-CHA zeolite layers formed by a selective sonication-assisted deposition method

Eunjoo Kim, Wanxi Cai, Hionsuck Baik, Jungkyu Choi

Department of Chemical and Biological Engineering

Research output: Contribution to journal › Article › peer-review

31 Citations (Scopus)

Abstract

Discrimination against the majority: The broad size distribution of conventional near-cubic Si-CHA (all-silica chabazite) zeolites impedes the formation of a close-packed layer, which is critical for the manufacture of zeolite films by secondary growth. Although present in lower abundance, platelike Si-CHA particles cosynthesized with near-cubic particles were deposited selectively on an α-Al₂O₃ disk to form a uniform layer.

Original language	English
Pages (from-to)	5280-5284
Number of pages	5
Journal	Angewandte Chemie - International Edition
Volume	52
Issue number	20
DOIs	https://doi.org/10.1002/anie.201301265
Publication status	Published - 2013 May 10

Keywords

X-ray diffraction
silica
sonication
uniform layers
zeolites

ASJC Scopus subject areas

Catalysis
Chemistry(all)

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10.1002/anie.201301265

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KW - zeolites

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Uniform Si-CHA zeolite layers formed by a selective sonication-assisted deposition method

Abstract

Keywords

ASJC Scopus subject areas

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