Variation of poly-Si grain structures under thermal annealing and its effect on the performance of TiN/Al2O3/Si3N4/SiO2/poly-Si capacitors
- Suk Bum Hong
- , Ju Hyun Park
- , Tae Ho Lee
- , Jun Hee Lim
- , Changhwan Shin
- , Young Woo Park
- , Tae Geun Kim*
*Corresponding author for this work
Research output: Contribution to journal › Article › peer-review
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