Abstract
Nano-imprinting lithography is one of the most promising key technologies for mass production of devices with nano-sized patterns. It is regarded as a tool for the next generation lithography (NGL). In this study, a thermally curable monomer solution was used for the imprinting process in order to lower imprinting pressure and temperature. A unique pressure vessel type imprinting system was used to imprint patterns as small as 150 nm over a whole 6 in. diameter wafer at a relatively low temperature (80 °C) and pressure (20 atm). Near zero residual layer under the trenches was successfully demonstrated over the whole 6 in. active area.
| Original language | English |
|---|---|
| Pages (from-to) | 168-174 |
| Number of pages | 7 |
| Journal | Microelectronic Engineering |
| Volume | 77 |
| Issue number | 2 |
| DOIs | |
| Publication status | Published - 2005 Feb |
Bibliographical note
Funding Information:The author deeply thanks NND Company for providing the engineering proto-type imprinting system for this study and financial support. This work is also partially supported by Korea University Grant.
Keywords
- High fidelity pattern transfer
- Pressurized chamber type imprinting system
- Self-assembled monolayer
- Thermal curing nano-imprinting lithography
- Thermal curing resin
- Zero residual layer
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Atomic and Molecular Physics, and Optics
- Condensed Matter Physics
- Surfaces, Coatings and Films
- Electrical and Electronic Engineering