Wavelet monitoring of plasma etching

Byungwhan Kim; Won Sun Choi; Myo Teak Lim

doi:10.1116/1.1617285

Wavelet monitoring of plasma etching

Byungwhan Kim, Won Sun Choi, Myo Teak Lim

School of Electrical Engineering

Research output: Contribution to journal › Article › peer-review

10 Citations (Scopus)

Original language	English
Pages (from-to)	2329-2333
Number of pages	5
Journal	Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume	21
Issue number	6
DOIs	https://doi.org/10.1116/1.1617285
Publication status	Published - 2003

ASJC Scopus subject areas

Condensed Matter Physics
Electrical and Electronic Engineering

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@article{9af038baf400414bba0d764f30b52bb7,

title = "Wavelet monitoring of plasma etching",

author = "Byungwhan Kim and Choi, {Won Sun} and Lim, {Myo Teak}",

year = "2003",

doi = "10.1116/1.1617285",

language = "English",

volume = "21",

pages = "2329--2333",

journal = "Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures",

issn = "1071-1023",

publisher = "AVS Science and Technology Society",

number = "6",

}

TY - JOUR

T1 - Wavelet monitoring of plasma etching

AU - Kim, Byungwhan

AU - Choi, Won Sun

AU - Lim, Myo Teak

PY - 2003

Y1 - 2003

UR - http://www.scopus.com/inward/record.url?scp=0942278376&partnerID=8YFLogxK

U2 - 10.1116/1.1617285

DO - 10.1116/1.1617285

M3 - Article

AN - SCOPUS:0942278376

SN - 1071-1023

VL - 21

SP - 2329

EP - 2333

JO - Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

JF - Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

IS - 6

ER -

Wavelet monitoring of plasma etching

ASJC Scopus subject areas

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