Fingerprint
Dive into the research topics of 'WSix/WN/polysilicon DRAM gate stack with a 50 Å WN layer as a diffusion barrier and an etch stop'. Together they form a unique fingerprint.- Sort by
- Weight
- Alphabetically
WSix/WN/polysilicon DRAM gate stack with a 50 Å WN layer as a diffusion barrier and an etch stop
Heon Lee, Dong Hwan Kim, Joo Youl Huh, Deok Kee Kim
Research output: Contribution to journal › Article › peer-review
3
Citations
(Scopus)